Mini retractor system TANKO-RF
CAUTION
Danger as a result of using incorrect cleaning media! Due to their material resistance, the materials used in the device impose certain restrictions on the cleaning media used. Failure to observe these restrictions can result in the failure of components or a device malfunction, causing material damage and consequential damage. • The cleaning media must be approved for all of the materials of the device (e.g. seals, bushings) and for the substances to be cleaned in the container that come into contact with it. • Cleaning media containing the following (corrosive) substances may NOT be used: – chlorine and chlorine ions – substances containing salt (no resistance to seawater) – moderately to highly concentrated organic acids – strong acids, in particular nitric acid and sulfuric acid (with acid content >65%) – aliphatic, aromatic and chlorinated hydrocarbons – phenols – fluorine compounds Risk of damage to the device from the cleaning medium! Dirt or foreign matter in the cleaning medium can have a negative effect on the functional availability of the device. There is a risk of material damage and consequential damage. • Use a suitable filter system in the cleaning medium supply line. The use of a filter with a filtration effect corresponding to a mesh width of 50 µm is recommended. • Adhere to the instructions on the supply and return lines in Section 5.2 Installation .
NOTE
The Following Media are Permitted for Use for Container Cleaning: Only clean and sprayable liquids may generally be used (e.g. water with alkaline cleaning additives and similar).
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Operating/Installation instructions 2023/09
3 Design and Function
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